ʻO Cobalt Silicide, CoSi2

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ʻO Cobalt Silicide, CoSi2

ʻO ka haʻina kemika CoSi2. ʻO ke kaupaona mole he 115.11. Aniani ʻeleʻele orthorhombic ʻeleʻele. ʻO 1277 The ke kiko hoʻoheheʻe, a ʻo ka density density is 5.3. Hiki iā ia ke oxidized ma 1200 ℃ a holoi i kona ʻili;


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Disalt pepehi kanaka ʻo Cobalt
ʻO ka haʻina kemika CoSi2. ʻO ke kaupaona mole he 115.11. Aniani ʻeleʻele orthorhombic ʻeleʻele.
ʻO 1277 The ke kiko hoʻoheheʻe, a ʻo ka density density is 5.3. Hiki iā ia ke oxidized ma 1200 ℃ a holoi i kona ʻili;

Hana ia me chlorine ma 300 ℃. Hoʻopau ʻia ia e ka hydrogen fluoride, dilute a concentrated nitric acid a me ka sulfuric acid, a hiki ke ʻānai ʻia hoʻi e ka alkali ikaika i hoʻoheheʻe ʻia. Hana mālie ia me ka waiū ʻochchloric paʻa wela ʻO CoSi2, me ka liʻiliʻi o ka pale a me ke kūpaʻa wela maikaʻi, hoʻohana ākea ʻia ma ke ʻano he pilina ma LSI. Eia kekahi, he ʻano aniani ko CoSi2 e like me ko Si, no laila hiki iā ia ke hana i epitaxial CoSi2 / Si ma luna o Si substrate e hoʻopaʻa i nā ʻano o ka silica epitaxial metala. Loaʻa i nā nanostructures Silicide nā polokalamu i hiki ke hoʻohana ʻia i loko o ke kaʻina o nanoelectronics: hiki ke hoʻohana ʻia nā semiconductor silicide nanostruktur (FeSi2) e hoʻomākaukau i nā hāmeʻa uila uila nano, a he mau polokalamu nui paha i loko o nā sano-i hoʻokumu ʻia me ka silikone; a me nā silicides metallic (CoSi2, Nisi2) hiki ke hoʻohana ʻia e like me nā nanowires i nā kamepiula kikoʻī a me nā kamepiula huakaʻi uila ʻo terahertz nano i ka wā e hiki mai ana. Ma muli o ka hiki ke hoʻomākaukau nā kaula silicide epitaxial ma luna o nā silicon substrates, e hoʻomaikaʻi nui ʻia kā lākou mau waiwai i ka hoʻohālikelike ʻia me nā nanowires metala maʻamau no ka mea ʻaʻohe palena palaoa; mea hao


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